Yazar "Finstad, T. G." için listeleme
-
Raman and TEM studies of Ge nanocrystal formation in SiOx : Ge/SiOx multilayers
Dana, A.; Agan, S.; Tokay, S.; Aydinh, A.; Finstad, T. G. (Wiley-V C H Verlag Gmbh, 2007)Alternating germanosilicate-siliconoxide layers of 10-30 nm thickness were grown on Si substrates by plasma enhanced chemically vapor deposition (PECVD). The compositions of the grown films were determined by X-ray ...